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Rubbing machine
GENERAL
The machine is intended for tracing grooves in the polyimid to orient the liquid crystal molecules. The grooves are made using a special rubbing cloth and have the depth of a few Angstrom.
PRINCIPLE
The substrate is fixed by vacuum onto a table that is moving back and forth under the rotating rubbing cloth.
- Uniform production, improved quality of alignment layers.
- Programmable rubbing cycle.
- Upgradable with automatic substrate loader.
- Detection of defective rubbing cloth
- Substrate size (diagonal): 356 mm (14") or higher
- Rotary table : 360°
- Adjustable rotation speed: 50 - 1000 rpm
- Rubbing torque: peak monitored
